Charge Neutralization Systems
Capital Equipment
Strong, deep ultraviolet irradiation neutralizes electric charge on EPROM and Flash memory. Neutralizes electric charge that can be problematic for plasma processing.
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Features & Benefits
- UV Charge Erasure
Intense deep ultraviolet irradiation neutralizes electric charge on substrates. This system has been adopted in semiconductor manufacturing lines, with over 700 units delivered. - High-Intensity Uniform Irradiation
Guaranteed initial illuminance is 650 mW/cm2 (at 220 to 320 nm) with ±10% uniformity. - Easy Lamp Unit Replacement
System downtime is reduced because no adjustment is required when replacing the lamp unit. - Extensive Product Lineup
Supports all work cassettes including 6-inch systems (5-inch or less also available), 8-inch systems (6-inch or less also available), and 12-inch dedicated systems. An 8-inch system with an excimer lamp is also available.
Applications
- Charge neutralization (EPROM, OTP, Flash memory)
- Pre-deposition charge neutralization
- Charge neutralization to avoid plasma processing problems and more
Specifications
- H120 Series
- 12-inch special-purpose equipment Equipped with SEMI-compliant load port to adopt EFEM. GEM300 compliant.
- H208 Series
- Support 8-inch and 6-inch devices
GUIDE TO EXPERIMENT AND DEMONSTRATOR DEVICES
Ushio provides experiment and demonstrator devices for customers who are considering purchase.
Please contact us for more details.
* Note that we may not be able to accommodate all requests depending on the intended type of experiment, purpose or application.
Requests for experimental devices / demonstrators
Please contact us for more details.
* Note that we may not be able to accommodate all requests depending on the intended type of experiment, purpose or application.
Requests for experimental devices / demonstrators