UX-4 Series
Full Field Projection Aligner
This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.
– Includes the world’s number one super high-pressure UV lamp
– Our own irradiation optical system boasting a high degree of uniformity
– Unrivaled large-area projector lens
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Features & Benefits
- Mask-damage free
- High productivity
- 3-dimensional exposure
- Thick-film resist support
- Proximity aligner mask diversion possible
Applications
- MEMS
- Crystal oscillators
- SAW filters
- RF devices
- Sensors
- Inkjet heads
- Diodes
- IGBT
- Power semiconductors
- Thyristors
- MOS-FETs
- LEDs
- Power amps
- MMICs
- BAW filters
- Acceleration sensors
- Inductors
- Passive components
- Solar cells and more
Specifications
