Full Field Projection Aligner UX-4 Series

UX-4 Series

Full Field Projection Aligner

This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.

Component Technology
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

Additional Links

Contact Us

Features & Benefits

  • Mask-damage free
  • High productivity
  • 3-dimensional exposure
  • Thick-film resist support
  • Proximity aligner mask diversion possible

Applications

  • MEMS
  • Crystal oscillators
  • SAW filters
  • RF devices
  • Sensors
  • Inkjet heads
  • Diodes
  • IGBT
  • Power semiconductors
  • Thyristors
  • MOS-FETs
  • LEDs
  • Power amps
  • MMICs
  • BAW filters
  • Acceleration sensors
  • Inductors
  • Passive components
  • Solar cells and more

Specifications

UX Series Lineup