Large Field Panel-Level Stepper UX-5 Series

UX-5 Series

Panel-Level Large Field Stepper

Ushio provides specialized steppers for FC-BGA and 2.xD packaging applications used in servers and PCs.

The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates.

Component Technology
- Includes the world's best-selling super high-pressure UV lamp
- Ushio's irradiation optical system boasts a high degree of uniformity
- Unrivaled large-area projector lens

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Applications

  • FC-BGA
  • FC-CSP
  • Interposer
  • 2.1D
  • 2.5D
  • Packaging
  • Semiconductor post-processing
  • RDL
  • Glass Panel Substrate

Features & Benefits

  • Large field projection lens
    Ushio's UX-5 can expose patterns up to 250 x 250 mm in a single shot. No stitching is required. This allows for maximum productivity even when handling large package sizes.
  • Suits a variety of alignment marks
    Pattern matching algorithm does not require particular alignment marks, alignment can be achieved through a variety of trace, pad or via patterns.
  • High resolution
    High resolution is obtained by using Ushio's projection lens "UPL series". It supports future design rules such as 5/5 μm and 3/3 μm Line/Space.
  • Large Depth of Focus
    Due to the large depth of focus, even if warpage or unevenness in the panel cause focal deviation, the pattern profile is obtained. This feature is particularly effective for thick dry film resists or solder resists.
  • High-speed step-and-repeat by surface stages
    Precision air bearings are used to reduce friction, and a plane motor configuration is used to reduce the weight of all moving parts and increase their rigidity. As a result, it is possible to perform high-speed step-and-repeat operations. In addition, the surface stage exerts feedback control using a laser interferometer. Consequently, high-speed operations, as well as superior positioning accuracy, can be achieved.
  • Elimination of mask damage
    Since this is a non-contact projection exposure system, the mask and panel do not come into direct contact. This not only prevents trace pattern defects but also makes it possible to use the mask semipermanently, reducing running costs. Moreover, since the mask requires no cleaning, we expect improved equipment utilization compared to close contact exposure systems.
  • High overlay accuracy maintained despite panel deformation
    The "auto scale function" compensates panel deformation by automatically changing the magnification up to 0.1%, greatly reducing the deviation in alignment.

UX-5 Series

ModelExposure AreaSubstrate SizeResolutionThroughputWavelength
UX-5881SC250 x 250 mm510 x 515 mm16 µm L/S120 panels/hi+h line
UX-5894SC250 x 250 mm510 x 515 mm5 µm L/S120 panels/hi line
UX-58112SC250 x 250 mm510 x 515 mm3 µm L/S120 panels/hi line
UX-59113SE> 100 x 100 mm510 x 515 mm1.5 μm L/STBDi line

Supports Future Design Rules

Close-up of a metal comb with evenly spaced teeth; a measurement scale is visible at the bottom.

3μm L/S, 15μm thickness

Supports Substrate Shrinkage

Large Depth of Focus

Three panels showing lithography resist line/space patterns at offsets -40 µm, 0, and +40 µm; each panel framed in green. Caption notes UX-5894SC tool, Resonac RY-5815 resist, 4/6 µm L/S, 15 µm thick.
UX Series Lineup